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  • Tungsten(VI) fluoride, also known as tungsten hexafluoride, is a colorless gas.
  • Tungsten Hexafluoride is nonflammable, but highly corrosive and very toxic.
  • Tungsten Hexafluoride is the densest known gas at a pressure of 1 atm and room temperature (25 °C).
  • The molecule is octahedral with the symmetry point group of Oh.
  • Tungsten(V1) fluoride is a colorless gas that condenses to a colorless liquid at 19.5” and freezes to a crystalline white solid at 2.5”.
  • Tungsten(V1) fluoride fumes in moist air and must be handled under anhydrous conditions.
  • The specific gravity of the liquid is 3.441 at 15’. It may be handled in carefully outgassed glass systems provided that greases, mercury, and organic materials, as well as water, are absent from the system.
  • Tungsten Hexafluoride gas is most commonly used in the production of semiconductor circuits and circuit boards, through the process of chemical vapor deposition.
  • Tungsten hexafluoride of a purity high enough for semiconductor CVD is produced by the reaction of fluorine gas with tungsten metal.
  • The metal is placed in a heated reactor, slightly pressurized to 1.2 to 2.0 psi, with a constant flow of WF6 infused with a small amount of fluorine gas.
  • On contact with water tungsten(VI) fluoride forms hydrofluoric acid (HF), which can penetrate the skin and cause damage to the subdermal tissues and bone. Inhalation burns the respiratory tract and can be toxic.
  • WF6 is a lachrymator which causes tearing and irritation of the eyes. Contact causes burns to the eyes, skin and mucous membranes.

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